Lithography & Nanostructures

E-Beam lithography

state of the art 100 keV high resolution electron beam lithography system with high resolution laser inferometer stage
nanometer precise patterns over large areas
precision marks for exact positioning
patterning of distributed feedback grating for single mode lasers
micro- and nanostructures with dimensions down to 10 nm on wafer-like substrates with diameters up to 6"

nanoplus electron beam lithography

Figure 2: nanoplus FEM photograph of E-Beam lithography

Figure 1: nanoplus FEM photograph of imprint lithography

Figure 2: nanoplus FEM photograph of imprint lithography

We offer tailor made nanostructures for your successful research and development, using a wide range of technologies including