Services

Customized Services & Technology Development

Our expertise

nanoplus has more than 20 years of experience in semiconductor patterning and processing. These technological capabilities are available to our customers. They allow them to explore new technologies in their products and tools, or to investigate new device concepts.

Benefit from our know-how for your product development in such fields as

photonics
plasmonics
nanoelectronics and
nanomechanics

Key features

Rely on our customized solutions and take advantage of:

low cost of ownership
reduced time to market
our experienced optical designers

nanoplus services

nanoplus offers R&D solutions for your specific application in the fields of customized laser development, lithography & nanostructures, semiconductor processing, complex multilayer coating as well as analysis of material properties. We design any sub-system and have many ready-made options. Find out how we can help you.

Our services

What do you need?

Customized laser development

nanoplus structure of tapered laser

Customized laser development

nanoplus FEM photograph of tapered laser

E-Beam Lithographie

nanoplus electron beam lithography

E-Beam Lithographie

nanoplus FEM photograph of E-Beam lithography

Semiconductor processing

nanoplus field emission electron microscope

Analysis of material properties

High-resolution picture of semiconductor structure

Complex multilayer coating

nanoplus electron beam evaporation system

Customized Laser Development

Some applications require the creation of new semiconductor lasers. We bring them into existence in close collaboration with our customers.

E-Beam Lithography

We offer a variety of e-beam services with our state of the art 100 keV high resolution electron beam lithography system with high resolution laser inferometer stage

nanometer precise patterns over large areas
precision marks for exact positioning
patterning of distributed feedback grating for single mode lasers
micro- and nanostructures with dimensions down to 10 nm on wafer-like substrates with diameters up to 6"

Nanostructures

We offer tailor made nanostructures for your successful research and development, using a wide range of technologies including

molecular beam epitaxy of quantum well or quantum dot structures
electron beam lithography
dry etching
metallization, insulation and planarization

Semiconductor processing

Pattern transfer into semiconductor materials:

dry and wet etching techniques
smooth and vertical etched side walls and precise depth control
wide range of III-V compound semiconductors
thermal and electron beam based evaporation systems
sputter coating
polymer based planarization

Complex Multilayer Coating

Complex multilayer coatings based on a variety of dielectrics or metals such as
SiO₂, TiO₂, Al₂O₃, Si₃N₄, AIN, TIN, BaF₂, Si, Au, Cr, Ni, Pt and Ti for the realization of:

highly reflective or anti-reflective coatings
optical filters
electrical and thermal insulation
electrical contact layers
planarization

Deposition technologies:
ion beam sputtering
magnetron sputtering
thermal evaporation
electron beam evaporation

Analysis of Material Properties

Advanced analysis of crystalline, electrical, optical and topological material properties:

high resolution X-ray diffraction (HRXRD)
photoluminescence (PL)
Fourier transform infrared spectroscopy (FTIR)
electroluminescence (EL)
scanning electron microscopy (SEM)

Your project

Custom solutions

Tell us more about your needs & let us find a solution together.