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Services

Customized Services & Technology Development

Our expertise

nanoplus has more than 20 years of experience in semiconductor patterning and processing. These technological capabilities are available to our customers. They allow them to explore new technologies in their products and tools, or to investigate new device concepts.

Benefit from our know-how for your product development in such fields as

  • photonics
  • plasmonics
  • nanoelectronics and
  • nanomechanics

Key features

Rely on our customized solutions and take advantage of:

  • low cost of ownership
  • reduced time to market
  • our experienced optical designers

nanoplus services

nanoplus offers R&D solutions for your specific application in the fields of customized laser development, lithography & nanostructures, semiconductor processing, complex multilayer coating as well as analysis of material properties. We design any sub-system and have many ready-made options. Find out how we can help you.

Our services

What do you need?

Customized Laser Development

Some applications require the creation of new semiconductor lasers. We bring them into existence in close collaboration with our customers.

E-Beam Lithography

We offer a variety of e-beam services with our state of the art 100 keV high resolution electron beam lithography system with high resolution laser inferometer stage

  • nanometer precise patterns over large areas
  • precision marks for exact positioning
  • patterning of distributed feedback grating for single mode lasers
  • micro- and nanostructures with dimensions down to 10 nm on wafer-like substrates with diameters up to 6"
Nanostructures

We offer tailor made nanostructures for your successful research and development, using a wide range of technologies including

  • molecular beam epitaxy of quantum well or quantum dot structures
  • electron beam lithography
  • dry etching
  • metallization, insulation and planarization
Semiconductor processing

Pattern transfer into semiconductor materials:

  • dry and wet etching techniques
  • smooth and vertical etched side walls and precise depth control
  • wide range of III-V compound semiconductors
  • thermal and electron beam based evaporation systems
  • sputter coating
  • polymer based planarization
Complex Multilayer Coating

Complex multilayer coatings based on a variety of dielectrics or metals such as
SiO2, TiO2, Al2O3, Si3N4, AIN, TIN, BaF2, Si, Au, Cr, Ni, Pt and Ti for the realization of:

  • highly reflective or anti-reflective coatings
  • optical filters
  • electrical and thermal insulation
  • electrical contact layers
  • planarization
  • Deposition technologies:
  • ion beam sputtering
  • magnetron sputtering
  • thermal evaporation
  • electron beam evaporation
Analysis of Material Properties

Advanced analysis of crystalline, electrical, optical and topological material properties:

  • high resolution X-ray diffraction (HRXRD)
  • photoluminescence (PL)
  • Fourier transform infrared spectroscopy (FTIR)
  • electroluminescence (EL)
  • scanning electron microscopy (SEM)
Your project

Custom solutions

Contact us

Tell us more about your needs & let us find a solution together.